Stack Tube Diffusion Furnace

  • Annealing, Oxidation & high temperature processing
  • Wafer size up to 300 mm
  • 3 or 4 tube stacks
  • Horizontal Laminar Flow (Class 10)
  • 400 to 1325 Deg. C ; 5 zone elements with 1 meter flat zone
  • Spike and Profile TC control with +/- 0.5 Deg. C control and Auto profiling capability
  • Automation solutions
  • Source cabinet – L shaped layout with Separately tube foyer and gases; vertically mounted gas panes



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