Semiconductor
MOT Wet Chemical Etching
- Modular system ideal for Industrial or R & D requirement
- Designed for use in clean room environment
- Shell is made of Polypropylene or stainless steel for solvent applications
- Heatable Quartz tank for clean wafer processing
- Additional process cells could be integrated made of PTEF,PVDF,PP….
- Automatic /Semi-automatic / Manual mode
- Suitable for Membranes, MEMS, CMOS, Sensors, Porous Silicon, Fused Silica
- Wafer size up to 300 mm; batch or single wafer version
- Circulation and heating systems
- Automatic Chemical drain and dosing unit on request
- Touch panel for easy operation
- Optional Spin Rinser Dryer (SRD)
