MOT Wet Chemical Etching

  • Modular system ideal for Industrial or R & D requirement
  • Designed for use in clean room environment
  • Shell is made of Polypropylene or stainless steel for solvent applications
  • Heatable Quartz tank for clean wafer processing
  • Additional process cells could be integrated made of PTEF,PVDF,PP….
  • Automatic /Semi-automatic / Manual mode
  • Suitable for Membranes, MEMS, CMOS, Sensors, Porous Silicon, Fused Silica
  • Wafer size up to 300 mm; batch or single wafer version
  • Circulation and heating systems
  • Automatic Chemical drain and dosing unit on request
  • Touch panel for easy operation
  • Optional Spin Rinser Dryer (SRD)


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